Universal Enterprise
Search:

From Universal Enterprise

Resource

Glossary of Technical Terms: M


A

B

C

D

E

F

G

H

I

J

K

L

M

N

O

P

Q

R

S

T

U

V

W

X

Y

Z


Hg mercury
M million; mega
MACT maximum achievable control technology
MALDI matrix-assisted laser desorption and ionization
MAN metropolitan area network
MAP manufacturing automation protocol
MAWP maximum allowable working pressure
MB machine batch
MBC machine bath collection
MBE molecular beam epitaxy
MBPC model-based process control
MBTC model-based temperature control
MCBA mean cycles between assists
MCBF mean cycles between failures
MCBI mean cycles between interrupts
MCM multichip module; manufacturing cycle management
MCP master control processor;multichip package
MCS material control system
MCU microprocessor control unit; mobile calibration unit
MCVD metal chemical vapor deposition
MDL minimum detection limit;
MD-MOS multi-drain metal-oxide semiconductor
MDQ market-driven quality
MEBS medium energy backscattering spectrometry
MEEF mask error enhancement factor
MEMS microelectromechanical system
MERIE magnetically enhanced reactive ion etching
MES manufacturing execution systems
MESFET metal-semiconductor field-effect transistor
METS Materials and Equipment Trading Service
MeV mega electron volt
MFC mass flow controller
MFM mass flow meter
Mg magnesium
MG manufactured goods
MHI material hazard index
MHz megahertz
MIC monolithic integrated circuit
MID material ID
MIE magnetron ion etching
MIM metal-insulator-metal
MIS metal insulator silicon
MLCC multilayer ceramic capacitor
MLL modify lot location
MLM multilevel metal
MLR message log report
MMC Manufacturing Methods Council
MMD Microlithographic Mask Development program
MMIC monolithic microwave integrated circuit
MMM material movement management
MMMS Material Movement
MMO multimodel optimization
MMOS modified MOS
MMST Microelectronics Manufacturing Science and Technology
Mn manganese
MNOS metal-nitride-oxide semiconductor
MNS metal-nitride semiconductor
Mo molybdenum
MO metal-organic
MOCVD metal-organic chemical vapor deposition
MOP modify operating procedures
MOS metal-oxide semiconductor
MOS-C metal-oxide semiconductor capacitor
MOSFET metal-oxide semiconductor field-effect transistor mp melting point
MP massively parallel
MP-OES multipoint optical emission spectroscopy
MPRES modular plasma reactor simulator
MPU microprocessor unit
MRP materials requirements planning
MRP-II manufacturing resource planning
MS mass spectrometry; mass spectroscopy
MSDS Material Safety Data Sheet
MSEM Metrology Specific Equipment Model
MSG Management Steering Group
MSHA Mine Safety and Health Administration
MSI medium-scale integration; manufacturing support item
MSID mass spectrometer lead detector
MSLD mass spectrometer leak detector
MSTAB Manufacturing Systems Technical Advisory Board
MTBA mean time between assists
MTBF mean time between failures
MTBFp mean (productive) time between failures
MTBI mean time between interrupt; mean time between incident
MTOL mean time off line; mean time on line
MTS Material Tracking Standard
MTTA mean time to assist
MTTF mean time to failure
MTTR mean time to repair
MV megavolt
MVTR moisture vapor transmission rate
MW molecular weight
MWBC mean wafers between cleans
MWT monitor wafer turner




Email:sales@ue.com.hk  |  Tel: +852-2771 1286  |  Fax: +852-2771 1025  |  Online Feedback
Copyright (C) 1992-2007 Universal Enterprise. All rights reserved.
Powered by Immedia Solutions
User Login