| Ag |
silver |
| Management |
Standard |
| Na |
sodium |
| S |
sulfur |
| S/D |
source/drain |
| S/N |
signal-to-noise |
| SA |
surface area; subresolution assist; structured analysis |
| SAM |
scanning auger microscopy |
| SAT |
spray acid tool |
| SAW |
surface acoustic wave |
| SB |
strong base ion exchange |
| SC1 |
Standard Clean 1 |
| SC2 |
Standard Clean 2 |
| SCA |
surface charge analysis |
| SCALE |
SEMATECH Cell Application Learning Environment |
| SCALPEL |
scattering with aperture limited projection lithography |
| SCC |
strategic cell controller |
| SCCS |
source code control system |
| SCE |
short channel effects |
| SCF |
super critical fluid |
| SCI |
surface charge imaging |
| SCM |
scanning capacitance microscopy |
| SCOE |
SEMATECH Center of Excellence |
| SCP |
single-chip package |
| SCR |
silicon-controlled rectifier |
| SD |
small dual in-line package; structured design |
| SDFL |
Schottky-diode FET logic |
| Se |
selenium |
| SE |
spectroscopic ellipsometry; secondary electron |
| SEAJ |
Semiconductor Equipment Association of Japan |
| SEC |
size exclusion chromatography |
| SECS |
Semiconductor Equipment Communications Standard |
| SEG |
selective epitaxial growth |
| SEIM |
software engineering improvement method |
| SEM |
scanning electron microscopy; specific equipment model |
| SEMI |
Semiconductor Equipment and Materials International |
| SFC |
supercritical fluid chromatography |
| SFCS |
shop floor control system |
| SGMRS |
Semiconductor Generic Manufacturing Requirements Specification |
| Si |
silicon |
| SIA |
Semiconductor Industry Association |
| SIDP |
sputter ion depth profiling |
| SIMO |
single input |
| SIMOX |
separation by implantation of oxygen |
| SIMS |
secondary ion mass spectroscopy |
| SiP |
system-in-a-package |
| SISO |
single input |
| SL |
specification limit |
| SLAM |
scanning laser acoustic microscopy; single-layer aluminum metallization |
| SLC |
surface laminar circuit |
| SM |
stress migration |
| SMB |
single-mask bumping |
| SMC |
surface-mounted component |
| SME |
subject matter expert; software maintenance engineer |
| SMIF |
standard mechanical interface |
| SMPM |
SECS message protocol machine |
| SMS |
SECS message service |
| SMTS |
Strategic Material Transport System |
| SNMS |
sputtered neutral mass spectroscopy |
| SNOM |
scanning near-field optical microscopy |
| SNR |
signal-to-noise ratio |
| SO |
small outline (package) |
| SoC |
system-on-a-chip |
| SOD |
spin-on dielectric |
| SODAS |
SEMATECH Organized Damage Analysis Software |
| SOG |
spin-on glass |
| SOI |
silicon on insulator |
| SOIC |
small outline integrated circuit |
| SOM |
scanning optical microscopy; sulfuric acid-ozone mixture |
| SoP |
system-on-a-package |
| SOP |
standard operating procedure |
| SOS |
silicon on sapphire |
| SPC |
statistical process control |
| SPICE |
simulation program with integrated circuit emphasis |
| SPIDER |
SEMATECH Process Induced Damage Effect Revealer |
| SPIDER-MEM |
SPIDER-Manufacturing Equipment Monitor |
| SPIN |
Software Process Improvement Network |
| SPM |
scanning probe microscopy |
| SPP |
single-phase printing |
| SPR |
semiconductor process representation |
| SPV |
surface photo voltage |
| SQC |
statistical quality control |
| SQPMM |
Software Quality and Process Maturity Model |
| Sr |
strontium |
| SRAM |
static random access memory |
| SRC |
Semiconductor Research Corp. |
| SRP |
spreading resistance probe |
| SRS |
software requirements specification |
| SSA |
Semiconductor Safety Association; spatial signature analysis |
| SSE |
sum squared error |
| SSEM |
Stepper Specific Equipment Model |
| SSI |
small-scale integration |
| SSM |
strategic sourcing methodology |
| sSOI |
strained silicon on insulator |
| SSQA |
Standardized Supplier Quality Assessment |
| SSRL |
SEMATECH Software Reuse Library |
| SSRP |
SEMATECH Software Reuse Program |
| STAR |
simultaneous transmitted and reflected |
| STEL |
short-term exposure limit |
| STEM |
scanning transmission electron microscopy |
| STI |
shallow trench isolation |
| STM |
scanning tunneling microscopy |
| STP |
standard temperature and pressure; system test plan |
| SU |
subresolution attenuated |
| SWEAT |
standard wafer-level electromigration accelerated test |
| SWI |
static walkthrough/inspection |
| SWIM |
Semiconductor Workbench for Integrated Modeling |
| SWP |
single-wafer processing |
| SWR |
semiconductor wafer representation |
| SWV |
square wave voltammetry |
