Now we offer cleaning, rinsing and drying equipment for processing silicon wafers, flat panel displays and other microelectronics substrates. Our goal is to offer the best possible products to our customers utilizing our multiple years of experience.
We provide manual, semi-automated and fully-automated wet stations customized to meet customers' requirements(such as pre-diffusion cleaning, nitride films etching and photoresist stripping etc).
All our equipments comply with the following:
- SEMI(s2-93) Manufacturing Safety Guidelines
- FM-200 standards
We offer a wide range of bench materials such as SS, PP and FM-4910 approved materials.
Our wet stations include:
Fully-automated Wet Process Stations
Semi-automated Wet Stations
Manual Wet Stations
Chemical Cabinets:
Chemical Dispensing System
Chemical Blending System
Other Accessory for Wet station:
Pneumatic Robot Transfer System:
- Natural Polypropylene housing with N2 purge.
- Rotation capabilities of 0-180°C
- 30lb. Load capacity
- PLC Control
Servomotor Robot Transfer System
- Plastic housing with N2 purge
- Rotation capabilities of 0-180°C
- 50lbs Load capacity
- PLC or PC control
Process Tanks
We offer wide range of process tanks including ambient tank, overflow cascade rinser, utility sink low/med/high temperature, recirculating, filtered
tanks, ultrasonic tank, megasonic tank etc.
- quick dump rinser
- filtered etched tank
 
Tank materials :PP, PVDF, PFA, Quartz, SS
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