Now we offer cleaning, rinsing and drying equipment for processing silicon wafers, flat panel displays, and other microelectronics substrates. Our goal is to offer the best possible products to our customers utilizing our multiple years of experience.

We provide manual, semi-automated and fully-automated wet stations customized to meet customers' requirements(such as pre-diffusion cleaning, nitride films etching and photoresist stripping etc).

All our equipment comply with the following:

  • SEMI(s2-93) Manufacturing Safety Guidelines
  • FM-200 standards

We offer a wide range of bench materials such as SS, PP and FM-4910 approved materials.

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Our wet stations include:

Fully-automated Wet Process Stations

Semi-automated Wet Stations

Manual Wet Stations

Chemical Cabinets:

Chemical Dispensing System

Chemical Blending System

Other Accessories for the wet station:

Pneumatic Robot Transfer System:

  • Natural Polypropylene housing with an N2 purge.
  • Rotation capabilities of 0-180°C
  • 30lb. Load capacity
  • PLC Control

Servomotor Robot Transfer System

  • Plastic housing with N2 purge
  • Rotation capabilities of 0-180°C
  • 50lbs Load capacity
  • PLC or PC control

Process Tanks

We offer a wide range of process tanks including ambient tank, overflow cascade rinser, utility sink low/med/high temperature, recirculating, filtered tanks, ultrasonic tank, megasonic tank etc.

  • quick dump rinser
  • filtered etched tank

 

Tank materials :PP, PVDF, PFA, Quartz, SS